참고문헌
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- J. of Vac. Sci.Technol. v.A9 no.4 Intrinsic stress in sputtered thin films H. Windishmann
- J. of Vac. Sci. Technol. v.A12 no.3 Characterization of silver films deposited by radio frequency magnetron sputtering N. Marechal;E. Quesnel;Y. Pauleau
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- J. of Vac. Sci. Technol. v.A9 no.1 Stress in sputtered Mo thin films: The effect of the discharge voltage T.J. Vink;B.A.D. vanZon
- J. of Vac. Sci. Technol. v.14 no.1 Internal stresses in titanium, nickel, molybdenum and tantalum films deposited by cylindrical magnetron sputtering J.A. Thornton;D.W. Hoffman
- J. of Vac. Sci. Technol. v.A11 no.3 Residual stresses and fracture properties of magnetron sputtered Ti films on Si microelements H. Liungcrantz;L. Hultman;J.E. Sundgren;S. Johansson;N. Kristensen;J.A. Schweitz;C.J. Shute
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- J. of Vac. Sci. Technol. v.A7 no.3 Stress in Y₂O₃thin films deposited by radio-frequency magetron and ion beam sputtering R.W. Tustison;T.E. Varitimos;D.G. Montanari;J.M. Wahl
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- J. Vac. Sci. Technol. v.A7 no.3 Temperature dependence of intrinsic stress in Fe, Si, and AIN preparaed by ion beam sputtering H. Windishmann
- J. of Vac. Sci. Technol. v.A9 no.5 Growth and microstructural study of radio frequency magnetron sputered MgO films on silicon R. Pinto;J.I. Poothra;S.C. Purandare;S.P. Pai;C.P. D'Souza;D. Kumar;M. Sharon
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