A Study on the Control Performance for Hazardous Gases by Surface Discharge induced Plasma Chemical Process

연면방전의 플라즈마 화학처리에 의한 유해가스제어 성능에 관한 연구

  • 이주상 (서울시립대학교 환경공학과) ;
  • 김신도 (서울시립대학교 환경공학과) ;
  • 김광영 (신성기술연구소 환경개발부) ;
  • 김종호 (한서대학교 환경공학과)
  • Published : 1995.06.01

Abstract

Recently, because of the worse of the air pollution, the excessive airtught of building and the inferiority of air conditioning system, the development of high efficiency air purification technology was enlarged to the environmental improvement of an indoor or a harmful working condition. The air purification technology has used chemical filters or charcoal filters or charcoal to remove hazardouse gaseous pollutants (SO$_{x}$, NO$_{x}$, NH$_{3}$, etc.) by air pollutant control technology, but they have many problems of high pressure loss, short life, wide space possession, and treatment of secondary wastes. For these reason, the object of reasearch shall be hazardous gaseous pollutants removal by the surface discharge induced plasma chemical process that is A.C. discharge of multistreams applied A.C. voltage and frequency between plane induced eletrode and line discharge eletrode of tungsten, platinum or titanium with a high purified alumina sheet having a film-like plane. As a result, the control performance for hazardous gaseous pollutants showed very high efficiency in the normal temperature and pressure. Also, after comtact oxidation decomposition of harmful gaseous pollutants, the remainded ozone concentration was found much lower than that of ACGIH or air pollution criteria in Korea.rea.

Keywords

References

  1. 第9回 空氣淨化 コソタミネ-ッョソコソトロ-ル 硏究大會 ォソソ脫臭裝置ADOの特性 增田閃一;松田昇;堤增美
  2. The 4th Internatioanl Symposium on Building and Urban Environmental Engineering and Management Control of Gaseous pollutants and Air Toxics by Surface Discharge induced Plasma Chemical process (SPCP) and Pulse Corona Induced Plasma Chemical Process(PPCP) Kwang Young Kim;Senichi Masuda
  3. 放電フラズマ揚におけるる ラジカルル 生成の高效率のたみの 基礎的硏究 定方正毅
  4. Destruction on of Gaseous pollutans and Air Tixics by Sutace Discharge Induced plasma chemical process and pulse Coroma Induced plasma Chemical Process S.Masuda
  5. 플라즈마 식각장비재작 및 식각 연구(석사학위논문) 홍창희
  6. Radiat. phys. Chem. v.11 Radiation Tretment of Exhaust gases Ⅳ. Oxidation of no in the Moistmixture of O₂and N₂ Okihiro Tokunaga;Koichi Nishimura;Nobutake Suzuki