대한기계학회논문집 (Transactions of the Korean Society of Mechanical Engineers)
- 제19권5호
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- Pages.1319-1332
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- 1995
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- 1225-5963(pISSN)
DOI QR Code
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Analysis of Particle Deposition onto a Heated or Cooled, Horizontal Free-Standing Wafer Surface
초록
Numerical analysis was performed to characterize the particle deposition behavior on a horizontal free-standing wafer with thermophoretic effect under the turbulent flow field. A low Reynolds number k-.epsilon. turbulence model was used to analyze the turbulent flow field around the wafer, and the temperature field for the calculation of the thermophoretic effect was predicted from the energy equation introducing the eddy diffusivity concept. The deposition mechanisms considered were convection, diffusion, sedimentation, turbulence and thermophoresis. For both the upper and lower surfaces of the wafer, the averaged particle deposition velocities and their radial distributions were calculated and compared with the laminar flow results and available experimental data. It was shown by the calculated averaged particle deposition velocities on the upper surface of the wafer that the deposition-free zone, where the deposition velocite is lower than 10
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