Journal of Sensor Science and Technology (센서학회지)
- Volume 4 Issue 2
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- Pages.51-57
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- 1995
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- 1225-5475(pISSN)
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- 2093-7563(eISSN)
Properties of ITO thin films fabricated by R.F magnetron sputtering
R.F. magnetron sputtering 법으로 제작한 ITO 박막의 특성
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Jeong, W.J.
(Dept. of Elec. Eng. Chonnam Nat'l Univ.) ;
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Park, G.C.
(Dept. of Elec. Eng. Mokpo Nat'l Univ.) ;
- Yoo, Y.T. (Dept. of Electronics Chonnam Nat'l Univ.)
- Published : 1995.05.31
Abstract
Indium Tin Oxide (ITO) thin films have been fabricated by the rf magnetron sputtering technique with a target of a mixture
Indium Tin Oxide (ITO) 박막을
Keywords