Bulletin of the Korean Chemical Society

Korean Chemical Society (대한화학회)
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Interaction of Hydrosilanes with the Surface of Rhodium

  • Boo Bong Hyun (Department of Chemistry, Chungnam National University) ;
  • Hong Seung Ki (Department of Chemistry, Chungnam National University) ;
  • Lee Sun Sook (Department of Chemistry, Chungnam National University) ;
  • Kim Hyun Sook (Department of Chemistry, Chungnam National University)
  • Published : 1994.12.20
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Abstract

Interaction of triethylsilane and diphenylsilane ($Ph_2$$SiH_2$, $Ph_2$$SiD_2$) with the surfaces of rhodium has been examined by trapping the reaction intermediates with 2,3-dimethyl-l,3-butadiene. 1,4-Hydrosilylation of the diene is predominantly observed to occur under mild condition over the rhodium catalyst. It is inferred from the product analyses that silylene and silyl radicals bonded to rhodium surfaces are the intermediates for addition of silylene to the diene, and for 1,4-hydrosilylation, respectively.

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References

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