Journal of the Korean Institute of Telematics and Electronics A (전자공학회논문지A)
- Volume 31A Issue 7
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- Pages.69-75
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- 1994
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- 1016-135X(pISSN)
Very Fine Photoresist Pattern Formation using Double Exposure of Optical Wafer Stepper
Optical Stepper의 이중노광에 의한 미세한 포토레지스트 패턴의 형성
Abstract
A very fine pattern formation process using double exposure is investigated, which can overcome the resolution limit of optical wafer stepper. The very fine pattern can be obtained by moving the edge profile of large pattern by means of moving the stepper stage. The simulation results show that the light transmittance decrease bellow 9%, and the contrast increase to 16.6% for the 0.3
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