한국표면공학회지 (Journal of the Korean institute of surface engineering)
- 제27권3호
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- Pages.143-148
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- 1994
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
절삭공구용 Ti(C, N)피막의 HCD식 이온도금시 공정변수의 영향
HCD Ion Plating of Ti(C, N) Films for Cutting Tools
초록
Effects of process variables of HCD ion plating on the film composition of Ti(C, N) were analyzed. The mole ratio of carbon to nitrogen and that of non-metal to titanium in the film primarily depend on the partial pressure ratio of (
키워드