Journal of the Korean institute of surface engineering (한국표면공학회지)
- Volume 27 Issue 3
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- Pages.143-148
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- 1994
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
HCD Ion Plating of Ti(C, N) Films for Cutting Tools
절삭공구용 Ti(C, N)피막의 HCD식 이온도금시 공정변수의 영향
Abstract
Effects of process variables of HCD ion plating on the film composition of Ti(C, N) were analyzed. The mole ratio of carbon to nitrogen and that of non-metal to titanium in the film primarily depend on the partial pressure ratio of (
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