한국표면공학회지 (Journal of the Korean institute of surface engineering)
- 제27권2호
- /
- Pages.83-90
- /
- 1994
- /
- 1225-8024(pISSN)
- /
- 2288-8403(eISSN)
WSi$_2$ 이상산화 기구에 대한 조사
A Study of the mechanism for abnormal oxidation of WSi$_2$
초록
We have investigated the mechanism for the abnormal oxide growth occuring during oxidation of the crystalline tungsten silicide. TEM and XPS analysis reveal the abnormaly grown oxide layer consisting of crystalline
키워드