Journal of the Korean institute of surface engineering (한국표면공학회지)
- Volume 27 Issue 2
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- Pages.83-90
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- 1994
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- 1225-8024(pISSN)
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- 2288-8403(eISSN)
A Study of the mechanism for abnormal oxidation of WSi$_2$
WSi$_2$ 이상산화 기구에 대한 조사
Abstract
We have investigated the mechanism for the abnormal oxide growth occuring during oxidation of the crystalline tungsten silicide. TEM and XPS analysis reveal the abnormaly grown oxide layer consisting of crystalline
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