Electrical & Electronic Materials (E2M - 전기 전자와 첨단 소재)
- Volume 7 Issue 3
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- Pages.220-224
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- 1994
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- 2982-6268(pISSN)
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- 2982-6306(eISSN)
The optical analysis of Te-based ART structure for the optical recording media
광기록 매질로 이용되는 Te계 ART구조의 광학적 해석
Abstract
In this study, we discussed the optical property to find the optimal condition of Te-based antireflection trilayer(ART) structure for a high density optical recording. It was found that the optical property was improved by suggesting the environmental parameters satisfied the optimum condition. As the results, the optimized(.lambda.=8.000
Keywords
- Optical recording;
- Ablation;
- Te-based film;
- ART structure;
- anti-reflection trilayer structure;
- 1st and 2nd minimum ART;
- Contrast Ratio
- 대비도;
- 광기록;
- 반사방지 삼중층 구조;