평판인쇄용 Aluminum지지체의 표면처리에 관한 기초연구

The basic study on the surface treatment of aluminum substract for lithography

  • 발행 : 1994.04.01

초록

Recently, the photopolymer made of novolak resin as the base and the naphthoquinonediazide(NQD) as the photoreactive compound is used for the presensitized plate(PS plate). The reaction mechanism of the NQD-novolak resin on light exposure is considered. Upon exposure it undergoes a Wolff rearrangement, via ketene intermediate which react with water ti form an 3-indene carboxylic acid. It was also found that NQD type resin in this experiment shows a high relative sensitivity compared with imported sample from Japan.

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