대한전기학회논문지 (The Transactions of the Korean Institute of Electrical Engineers)
- 제43권5호
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- Pages.802-808
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- 1994
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- 0254-4172(pISSN)
플라즈마중합막의제작과레지스트 특성에 관한 연구
A Study on the Preparation and Resist Characterization of the Plasma Polymerized Thin Films
초록
The purpose of this paper is to describe an application of plasma polymerized thin film as an electron beam resist. Plasma polymerized thin film was prepared using an interelectrode capacitively coupled gas-flow-type reactor, and chosen methylmethacrylate(MMA)and methylmethacrylate-tetrameth-yltin(MMA-TMT) as a monomer. This thin films were also delineated by the electron-beam apparatus with an acceleration voltage of 30kV and an expose dose ranging from 20 to 900
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