The Transactions of the Korean Institute of Electrical Engineers (대한전기학회논문지)
- Volume 43 Issue 2
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- Pages.312-317
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- 1994
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- 0254-4172(pISSN)
Fabrication of High Voltage a-Si:H TFT Plasma Chemical Vapor Deposition
플라즈마 CVD에 의한 고전압 비정질 실리콘 박막 트랜지스터의 제작
Abstract
We studied the fabrication and electrical characteristics of high voltage hydrogenerated amorphous silicon thin film transistor using plasma enchanced chemical vapor deposition(PECVD). The device shows 2500
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