Journal of the Korean Vacuum Society (한국진공학회지)

The Korean Vacuum Society (한국진공학회)
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Hydrogen Depth Profiling by Nuclear Resonance Reaction

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  • Kim, Y. S. (Korea Institute of Geology, Mining and Materials) ;
  • Kim, J. M. (Korea Institute of Geology, Mining and Materials) ;
  • Hong, W. (Korea Institute of Geology, Mining and Materials) ;
  • Kim, D. K. (Korea Institute of Geology, Mining and Materials) ;
  • Cho, S. Y. (Korea Institute of Geology, Mining and Materials) ;
  • Woo, H. J. (Korea Institute of Geology, Mining and Materials) ;
  • Kim, N. B. (Korea Institute of Geology, Mining and Materials)
  • 김영석 (한국자원연구소 방사화분석연구그룹) ;
  • 김준곤 (한국자원연구소 방사화분석연구그룹) ;
  • 홍완 (한국자원연구소 방사화분석연구그룹) ;
  • 김덕경 (한국자원연구소 방사화분석연구그룹) ;
  • 조수영 (한국자원연구소 방사화분석연구그룹) ;
  • 우형주 (한국자원연구소 방사화분석연구그룹) ;
  • 김낙배 (한국자원연구소 방사화분석연구그룹)
  • Published : 1993.12.01
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Abstract

Hydrogen depth profiling was performed by H(19F, $\alpha$${\gamma}$) nuclear resonance reactin . A cesium sputtering ion sorce and 1.7MV Tandem Van de Graaff accelerator was used for the production of 6.5MeV 19F ion. The ${\gamma}$ rays produced by the reaction were measure dby 3" $\times$3" and 6" $\times$8" Nal detectors . A test measurement was done for hydrogen contaminatin layer of a bare silicon wafer, Si3N4(H) and Zr(O)a-Si/Si for the purpose of verifying the applicability , detection limit and the reliability of the method.ility of the method.

Keywords