A Study on the Possibility of Pattern Design Using CAD System (With concentration on the change of coat basic pattern)

CAD System을 이용한 패턴디자인설계 활용가능성에 관한 연구(I)-Coat 원형을 중심으로-

  • 김옥경 (성균관대학교 의상학과)
  • Published : 1993.05.01

Abstract

The purpose of this research was to utilize of Pattern Design System(P.D.S) by using AM-300 The conclusion were like these : 1. A coat of basic pattern was selected by design sketch. 2. The basic pattern was input into computer by digitizing. 3. The basic pattern was change into designed shape by using various skills. This system were enabled to draw straight lines, curves, delete lines, sections of lines, extend lines, cut pattern into sections, measure line or section reproduce whole pattern shape of section, rotate and mirror pattern and complete patterns. 4. Automatic grading of finished master pattern have been developed by creation and modification of grading rules of basic pattern. 5. Production pattern added seam allowance, not-ches was generated by P.D.S menu option. 6. Finished pattern design was plotted out 100% and 20% size by AM-300 Plotter. This results will be the basic materials to develop the CAD SYSTEM if some problems were improve. Furthermore, the utilization of P.D.S is expected to be developing in pattern making process.

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