The Effect of Titanium Interlayer on the Adhesion Properties of TiN Coating

Titanium Interlayer가 TiN 박막의 밀착특성에 미치는 영향

  • Kong, S.H. (Department of Metallurgical Engineering, Yonsei University) ;
  • Kim, H.W. (Department of Mechanical Engineering, Dankook University) ;
  • Shin, Y.S. (Saeil Heavy Industrial Co.) ;
  • Kim, M.I. (Department of Metallurgical Engineering, Yonsei University)
  • Published : 1992.03.31

Abstract

In order to improve adhesive force of TiN film, we sputtered titanium as interlayer before TiN deposition by Plasma Enhanced Chemical Vapour Deposition. We observed changes of hardness and adhesion at a various thickness of titanium interlayer and also examined analysis. At the critical thickness of the titanium interlayer(about $0.2{\mu}$), adhesive force of TiN films were promoted mostly. But over the critical thickness, a marked reduction of adhesive force was showed, because of the internal stress of titanium interlayer. From AES analysis, the adhesion improvement of TiN films was mainly caused by nitrogen diffusion into titanium interlayer during TiN deposition process which relieved stress concentration at TiN coating-substrate interface.

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