Korean Journal of Materials Research (한국재료학회지)
- Volume 2 Issue 1
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- Pages.19-26
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- 1992
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- 1225-0562(pISSN)
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- 2287-7258(eISSN)
Chemical Vapor Nucleation of Tungsten from $WF_6-SiH_4$ on Silicon Dioxide Surface
산화규소 표면위에서 $WF_6-SiH_4$ 화학증착에 의한 텅스텐 핵의 생성
- Choi, Kyeong-Keun (Semiconductor Research and Development Laboratory, Hyundai Electronics Industries Co.) ;
- Yi, Chung (Samsung Semiconductor R &D Center) ;
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Rhee, Shi-Woo
(Laboratory for Advanced Materials Processing Department of Chemical Engineering Pohang Institute of Science and Technology) ;
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Lee, Kun-Hong
(Laboratory for Advanced Materials Processing Department of Chemical Engineering Pohang Institute of Science and Technology)
- Published : 1992.02.01
Abstract
The rate of tungsten nuclei formation from
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