전자공학회논문지A (Journal of the Korean Institute of Telematics and Electronics A)
- 제28A권10호
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- Pages.840-846
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- 1991
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- 1016-135X(pISSN)
할로겐 램프에 의한 급속 열처리에서 기판 표면 상태에 따른 온도 상승 효과에 관한 연구
Effect of Surface States of the Substrate on the Temperature Rampup Rate During Rapid Thermal Annealing by Halogen Lamps
초록
In case of the rapid thermal process by halogen lamps, an optical pyrometer is generally used to measure the temperature. It is, however, necessary to measure the temperature by the thermocouple when the process temperature is lower than 700
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