Bulletin of the Korean Chemical Society

Korean Chemical Society (대한화학회)
권호 표지
DOI QR코드

DOI QR Code

Direct Anlysis of Impurities in Solides with Glow Discharge Mass Spectrometry

  • Ki Beom Lee (Inorgan. Anal. Chem. Lab., Korea Standards Research Institute) ;
  • Dae Won Moon (Inorgan. Anal. Chem. Lab., Korea Standards Research Institute) ;
  • Kwang Woo Lee (Inotgan. Anal. Chem. Lab., Korea Standards Research Institute)
  • Published : 1989.12.20
Download PDF
⟨ Previous Next ⟩

Abstract

A glow discharge mass spectrometric(GDMS) analytical method was developed for direct analysis of impurities in solids. Ions extracted from a glow discharge ion source with a sample as a cathode were analyzed by a quadrupole mass filter. Ion extractions were carried out through differentially-pumped orifices biased to positive and negative potentials. Operating parameters of the glow discharge source such as discharge current, orifice-to-cathode distance, energy analyzer setting and bias voltages have been optimized. The developed GDMS was applied to the analysis of KSS copper-base alloy standards certified by Korea Standards Research Institute(KSRI). In the analysis, the reproducibility and the detection limits were estimated to be about 2.5% RSD, and in the low ppm range, respectively.

Keywords

References

  1. Glow Discharge Processes B. Chapman
  2. Spectrochim. Acta v.23B W. Grimm
  3. Anal. Chem. v.44 P. W. J. M. Boumans
  4. Anal. Chem. v.48 D. S. Gough
  5. Anal. Chem. v.49 D. C. McDonald
  6. Analyst v.103 N. P. Ferreira;L. R. P. Butler
  7. Analyst v.108 H. Hughes
  8. Spectrochim. Acta v.39B J. B. Ko
  9. Anal. Chem. v.56 K. Wagatsuma;K. Hirokawa
  10. Analytical Science v.1 J. C. Woo;K. B. Lee;D. W. Moon;K. W. Lee
  11. Int. J. Mass Spectrom. Ion Phys. v.28 B. L. Bentz;C. G. Bruhn;W. W. Harrison
  12. Int. J. Mass Spectrom. Ion Phys. v.71 N. Jakubowski;D. Stuewer;G. Toelg
  13. Anal. Chem. v.59 N. Jakubowski;D. Stuewer;W. Vieth
  14. Anal. Chem. v.55 T. J. Loving;W. W. Harrison
  15. Anal. Chem. v.55 T. J. Loving;W. W. Harrison
  16. Analytica Chimica Acta v.155 M. Hecq;A. Hecq;M. Fontignies
  17. J. Metals v.39 K. Robinson;E. F. H. Hall
  18. Am. Lab. v.19 D. J. Hall;P. K. Robinson
  19. Prog. Analyt. Spectrosc. v.11 W. W. Harrison;B. L. Bentz
  20. Anal. Chem. v.58 W. W. Harrison;K. R. Hess;R. K. Marcus;F. L. King
  21. Appl. Spec. Rev. v.17 J. W. Coburn;W. W. Harrison
  22. Int. J. Mass Spectrom. Ion Phys. v.16 R. Pertel
  23. Anal. Chem. v.56 S. L. Tong;W. W. Harrison
  24. J. Res. Natl. Bur. Stand. v.93 J. C. Huneke
  25. Ion Beams: With Applications to Ion Implantation R. G. Wilson;G. R. Brewer
  26. Anal. Chem. v.58 R. K. Marcus;F. L. King;W. W. Harrison