한국표면공학회지 (Journal of the Korean institute of surface engineering)

  • 제21권3호
  • /
  • Pages.114-129
  • /
  • 1988
  • /
  • 1225-8024(pISSN)
  • /
  • 2288-8403(eISSN)
한국표면공학회 (The Korean Institute of Surface Engineering)
권호 표지

Physical Vapour Deposition Fundamentals and Technical Aspects

  • Juhn, Hermann A. (Forschungsinstitut fur Edelmetalle und Metallchmi)
  • 발행 : 1988.09.01
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초록

The principles of the physical vapour deposition processes(PVC); evaporation, sputting, and ion plating are presented and compared with each other with respect to coating properties, deposition rate and process control. The significance of coating sources and vacuum equipment for hard materials coating is discussed.

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