Journal of the Korean institute of surface engineering (한국표면공학회지)
- Volume 21 Issue 2
- /
- Pages.76-82
- /
- 1988
- /
- 1225-8024(pISSN)
- /
- 2288-8403(eISSN)
A New Mechanish of Bright Plating on the Ground of Analysis of Rate Nucleafion and Growth
결정의 발생속도식과 송장속도식의 해석에 지초한 광택니켈도금의 새로운 메카니즘
Abstract
The bright nickel electroplatings were carried out the Watt bath containg a solobel saccharin as class I brightner and para substituted benzaldehydes as class II one. Extended Huckel MO calculation was done and polarization was measured to examine between
Keywords