Journal of the Korean Institute of Telematics and Electronics (대한전자공학회논문지)
- Volume 24 Issue 6
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- Pages.980-985
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- 1987
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- 1016-135X(pISSN)
-Physical Properties of Metal Thin Film-(Changes of Structure with Evaporation Rates)
금속박막의 물리적 성질(I)(증착속도에 따르는 구조변화)
Abstract
The thin metal films of Cr, Al, Mn and were made in various evaporation rates with 100\ulcornerthickness under 2x10**-9 bar vacuum level. We analized and discussed the relationships between changes of structure, morphology and sheet resistance, light transmittance for the corresponding evaporation rates. As the evaporation rates were decreased at higher rates, grain sizes of all film were decreased, however both of the sheet resistance and light transmittance were increased. At lower evaporation rate, films of Cr and Cu porduced non-stoi-chiometric oxides but Al an Mn showed up amorphous structures.
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