The Transactions of the Korean Institute of Electrical Engineers (대한전기학회논문지)

The Korean Institute of Electrical Engineers (대한전기학회)
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A Study on Growth Mechanism of Organic Thin Films by the Plasma Polymerization

플라즈마동합법에 의한 유기피막의 성장기정에 관한 연구

  • 이덕철 (인하대 공대 전기공학과) ;
  • 한상옥 (충남대 공대 전기공학과) ;
  • 박구범 (인하대 대학원 전기공학과)
  • Published : 1987.01.01

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Abstract

TPolystyrene thin films are prepared by glow discharge of sytrene monomer vapor th establish the growth mechanism of organic thin films by the plasma polymerization. As the discharge parameters, discharge current(5mA-20mA), frequency (10kHz-50kHz, 13.56MHz), gaspressure (0.2torr-1.5torr), and discharge time(2min-12min)are adopted. Plasma-polymerized filmsof styrene vapor are identified as polystyrene by IR spectra. The thickness of plasma-polymerized films increases with gas pressure, frequency and discharge current in the region of the low frequency and below the allowed gas pressure where the polymerization occurs. It is suggested that the growth mechanism can be explained by ionic reaction in d.c. and low frequency region, and by radical reaction in high frequency region.

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