Synthesis of Photosensitive Resins Having a High Developing Power

고해상력을 가지는 감광성 고분자의 합성에 관한 연구

Photosensitive polymers, poly(β-cinnamoyloxyethylmethacrylate) and poly (3-cinna-moyloxy-2-hydroxypropylmethacrylate), were prepared. β-cinnamoyloxyethylmethacrylate was synthesized via two ways: (1) reaction of β-hydroxyethylmethacrylate with cinnamoyl chloride and (2) β-hydroxyethylcinnamate with methacryloyl chloride in pyridine at room temperature. Poly(3-cinnamoyloxy-2-hydroxypropylmethacrylate) was synthesized by polymer reaction of polyglycidylmethacrylate with cinnamic acid in methyl ethyl ketone at reflux temperature. The photosensitive characteristics of two kinds of polymer were investigated by using the yield of residual film and IR spectra. 5-Nitroacenaphthene, benzophenone, 2-nitrofluorene, Michler's ketone, and rose bengal were used as a sensitizer. The best yield of residual film was abtained when 5-nitroacenaphthene, benzophenone, 2-nitrofluorene, Michler's ketone, and rose bengal were added to the resin by weight percentage of 5,5,3,1, and 1 respectively. Among the five sensitizers, 5-nitroacenaphthene had the best sensitivity for the photosensitive polymers.