Streptomyces rimosus Plasmid DNA에 의한 Bacillus subtilis의 형질전환 조건

Transformation Conditions of Bacillus subtilis by Streptomyces rimosus Plasmid DNA

Bocillus subtilis를 유전공학의 숙주 세포로서 이용하기 위해서는 우선 적당한 vector의 개발이 요구된다. Oxytetracycline의 항생물질을 생산하는 방사선균인 Streptomyces rimosuf IFO 0014로 부터 oxytetracycline-resistant plasmid DNA를 pH 9.0의 phenol-buffer system으로 추출하여 B.subtilis KPM 60[St $r^{R}$-mutant of RM 125 (leu A8, arg 15, hsr $M^{-}$, hsm $M^{-}$)] 1균주에 형질전환시키면서 이 plasmid DNA가 표현되게 하였다. 이때 형질전환의 조건으로서 KPM60을 growth medium에서 3시간, competence medium에서는 30분내지 60분간 그리고 DNA와는 20분동안 접촉시킴으로서 가장 높은 빈도로 형질전환이 일어났다. (대개 $10^{-4}$ 빈도 이상) 또 recipient cell의 competence화에는 oH7.5에서 그리고 형질전환에는 2$0^{\circ}C$에서 최적상태를 보였다.

To exploit a suitable vector and recipient strain for molecular cloning in Bacillus subtilis, oxytetracycline-resistant plasmic DNA has been prepared from Streptomyces rimosus by phenol-buffer extraction of lysozyme-lysed cells and introduced into B. subtilis KPM 60 [St $r^{R}$-mutant of RM 125 (leu A8, arg 15, hsm $M^{-10}$ , hsr $M^{-10}$ )] by transformation. Oxitetracycline-resistant plasmid was well transferred into B. subtilis KPM 60 with average frequency of 10$^{-4}$ per $\mu\textrm{g}$ of DNA. The highest frequency of plasmid transformation was obtained after 3 hours incubation of recipient cells in the growth medium and 30 to 60 minutes incubation in the competence medium, and then 20 minutes contact of DNA and host cells. Optimum pH for competence was 7.5, and optimum temperature for transformation was 2$0^{\circ}C$.>.