Diffusion of Impurities Into Silicon by Spin-on Sources

Spin-On source에 의한 실리콘내의 불순물 확산

  • 김충기 (한국과학원 전기 및 전자공학과) ;
  • 정태원 (경북대학교 공과대학)
  • Published : 1978.11.01

Abstract

Diffusion processes of boron, phosphorus, and arsenic into silicon have been investigated using a new diffusion source called "spin-on source". Diffusion coefficients of these impurities have been calculated from the experimental results and are compared with the published values. Reasonable agreements have been found between the calculated and the published values. From this study, it is concluded that the spin-on source can be used as the diffusion source for integrated circuit fabricaticon.ricaticon.

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