ABS 수지상의 화학도금에서의 최적 Eteching 조건에 관한 연구

  • 김원택 (한양대학교 공과대학) ;
  • 이인배 (한양대학교 공과대학 조교)
  • Published : 1972.06.01

Abstract

We have studied about the optimum chemical etching and sensitizing conditions of the plating on plastics. As specimen 'Mitzubishi Nobren MM2A' was used. The results were as follow. 1) The optimum chemical etching conditions. Etched the specimens for $10{\sim}40$ minutes at $70{\sim}80^{\circ}C$ with the etching solution of table 1, and for $10{\sim}15$ minutes at $65{\sim}70^{\circ}C$ with the etching solution of table 2 Table 1. Etching solution (I) Composition : $H_2SO_4(95%)-Component : 250 ml, Composition : $H_3PO_4(85%)$ - Component : 75ml, Composition : $K_2Cr_2O_7$ - Component : 12.5g, 2) The optimum sensitizing conditions. Sensitized the specimens for $60{\sim}90$ seconds at $25^{\circ}C$ with the sensitizing solution of table 3 Table 2. Etching solution (II) Composition : $H_2SO_4(95%)$ - Component : 22.5ml, Composition : $H_3PO_4(85%)$ - Component : 15ml, Composition : $CrO_3$ - Component : 105g, Composition : Water - Component : 150 ml, Table 3. Sensitizing solution Composition : $SnCl_2$ - Component : 9g, Composition : HCl(35%) - Component : 36ml, Composition : Water - Component : 300 ml

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