Study of SF6/Ar plasma based textured glass surface morphology for high haze ratio of ITO films in thin film solar cell

  • Kang, Junyoung (College of Information and Communication Engineering, Sungkyunkwan University) ;
  • Hussain, Shahzada Qamar (Department of Energy Science, Sungkyunkwan University) ;
  • Kim, Sunbo (Department of Energy Science, Sungkyunkwan University) ;
  • Park, Hyeongsik (College of Information and Communication Engineering, Sungkyunkwan University) ;
  • Le, Anh Huy Tuan (College of Information and Communication Engineering, Sungkyunkwan University) ;
  • Yi, Junsin (College of Information and Communication Engineering, Sungkyunkwan University)
  • 발행 : 2016.02.17

초록

The front transparent conductive oxide (TCO) films in thin fill solar cell should exhibit high transparency, conductivity, good surface morphology and excellent light scattering properties. The light trapping phenomenon is limited due to random surface structure of TCO films. The proper control of surface structure and uniform cauliflower TCO films may be appropriate for efficient light trapping. We report light trapping scheme of ICP-RIE glass texturing by SF6/Ar plasma for high roughness and haze ratio of ITO films. It was observed that the variation of etching time, pattern size and Ar flow ratio during ICP-RIE process were important factors to improve the diffused transmittance and haze ratio of textured glass. The ICP-RIE textured glass showed low etching rates due to the presence of metal elements like Al, B, F and Na. The ITO films deposited on textured glass substrates showed the high RMS roughness and haze ratio in the visible wavelength region. The change in surface morphology showed negligible influence on electrical and structural properties of ITO films. The ITO films with high roughness and haze ratio can be used to improve the performance of thin film solar cells.

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