RF Plasma Processes Monitoring for Fluorocarbon Polluted Plasma Chamber Cleaning by Optical Emission Spectroscopy and Multivariate Analysis

Optical Emission Spectra 신호와 다변량분석기법을 통한 Fluorocarbon에 의해 오염된 반응기의 RF 플라즈마 세정공정 진단

Fault detection using optical emission spectra with modified K-means cluster analysis and principal component anal ysis are demonstrated for inductive coupl ed pl asma cl eaning processes. The optical emission spectra from optical emission spectroscopy (OES) are used for measurement. Furthermore, Principal component analysis and K-means cluster analysis algorithm is modified and applied to real-time detection and sensitivity enhancement for fluorocarbon cleaning processes. The proposed techniques show clear improvement of sensitivity and significant noise reduction when they are compared with single wavelength signals measured by OES. These techniques are expected to be applied to various plasma monitoring applications including fault detections as well as chamber cleaning endpoint detection.