Proceedings of the KIEE Conference (대한전기학회:학술대회논문집)

The Korean Institute of Electrical Engineers (대한전기학회)
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Effects of additive oxygen gas in sputtering on the properties of HAZO thin films

스퍼터링시 산소 가스 첨가에 따른 HAZO 박막의 물성 분석

  • Jun, Hyun-Sik (Dept. of Electronic Systems Engineering, Hanyang University) ;
  • Lee, Sang-Hyuk (Dept. of Electronic Systems Engineering, Hanyang University) ;
  • Park, Jin-Seok (Dept. of Electronic Systems Engineering, Hanyang University)
  • 전현식 (한양대학교 전사시스템공학과) ;
  • 이상혁 (한양대학교 전사시스템공학과) ;
  • 박진석 (한양대학교 전사시스템공학과)
  • Published : 2015.07.15
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Abstract

In this study, HAZO thin films were deposited on glass substrates at room temperature via co-sputtering with RF magnetron sputter. The effects of additive oxygen gas in sputtering on the structural and optical characteristics of HAZO thin films were investigated using X-ray diffraction and UV/Vis spectrometer. The experimental results confirmed that the hafnium oxides formed in the HAZO films when they were deposited with oxygen gas, which affected on the structure and transmittance of the films.

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