한국표면공학회:학술대회논문집 (Proceedings of the Korean Institute of Surface Engineering Conference)

한국표면공학회 (The Korean Institute of Surface Engineering)
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CrAlSiN 박막의 대기중 고온산화

High temperature air-oxidation of CrAlSiN thin films

  • Hwang, Yeon-Sang (School of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
  • Won, Seong-Bin (School of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
  • Chunyu, Xu (School of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
  • Kim, Seon-Gyu (School of Materials Science and Engineering, University of Ulsan) ;
  • Lee, Dong-Bok (School of Advanced Materials Science and Engineering, Sungkyunkwan University)
  • 발행 : 2013.05.30
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초록

Nano-multilayered CrAlSiN films consisting of crystalline CrN nanolayers and amorphous AlSiN nanolayers were deposited by cathodic arc plasma deposition. Their oxidation characteristics were studied between 600 and $1000^{\circ}C$ for up to 70 h in air. During their oxidation, the amorphous AlSiN nanolayers crystallized. The formed oxides consisted primarily of $Cr_2O_3$, ${\alpha}-Al_2O_3$, $SiO_2$. The outer $Al_2O_3$ layer formed by outward diffusion of Al ions. Simultaneously, an inner ($Al_2O_3$, $Cr_2O_3$)-mixed layer formed by the inward diffusion of oxygen ions. $SiO_2$ was present mainly in the lower part of the oxide layer due to its immobility. The CrAlSiN films displayed good oxidation resistance, owing to the formation of oxide crystallites of $Cr_2O_3$, ${\alpha}-Al_2O_3$, and amorphous $SiO_2$.

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