한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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- Pages.251.1-251.1
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- 2013
Oxidative Etching of Imprinted Nanopatterns by Combination of Vacuum Annealing and Plasma Treatment
- Park, Dae Keun (Department of Chemistry, Sungkyunkwan University) ;
- Kang, Aeyeon (Department of Chemistry, Sungkyunkwan University) ;
- Jeong, Mira (Korea Institute of Machinery and Materials (KIMM)) ;
- Lee, Jae-Jong (Korea Institute of Machinery and Materials (KIMM)) ;
- Yun, Wan Soo (Department of Chemistry, Sungkyunkwan University)
- 발행 : 2013.08.21
초록
Combination of oxidative vacuum annealing and oxygen plasma treatment can serve as a simple and efficient method of line-width modification of imprinted nanopatterns. Since the vacuum annealing and oxygen plasma could lead mass loss of polymeric materials, either one of the process can yield a narrowed patterns. However, the vacuum annealing process usually demands quite high temperatures (