Effects of High Neutral Beam Energy on the Properties of Amorphous Carbon Films

  • 이동혁 (고려대학교 디스플레이 반도체 물리학과) ;
  • 장진녕 (고려대학교 디스플레이 반도체 물리학과) ;
  • 권광호 (고려대학교 제어계측공학과) ;
  • 유석재 (국가핵융합연구소) ;
  • 이봉주 (국가핵융합연구소) ;
  • 홍문표 (고려대학교 디스플레이 반도체 물리학과)
  • Published : 2012.02.08

Abstract

The effects of argon neutral beam (NB) energy on the amorphous carbon (a-C) films were investigated, while the a-C films were deposited by neutral particle beam assisted sputtering (NBAS) system. The deposition characteristics of these films were studied as a function of NB energy (or reflector bias voltage). The film structures were investigated by Raman spectroscopy. The hardness was measured by nano-indentation tests and the optical band gap was measured by UV-visible spectroscopy.

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