Proceedings of the Korean Institute of Surface Engineering Conference (한국표면공학회:학술대회논문집)
- 2011.05a
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- Pages.30-30
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- 2011
Formation mechanism of SiOCH thin films by PECVD method
PECVD법에 의해 제작한 SiOCH 박막의 형성 메카니즘
- Published : 2011.05.19
Abstract
Keywords