한국자기학회:학술대회 개요집 (Proceedings of the Korean Magnestics Society Conference)
- 한국자기학회 2011년도 자성 및 자성재료 국제학술대회
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- Pages.29-30
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- 2011
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- 2233-9485(pISSN)
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- 2233-9574(eISSN)
Ion beam etching of sub-30nm scale Magnetic Tunnel Junction for minimizing sidewall leakage path
- Kim, Dae-Hong (Department of Electronic Engineering, Hanyang University) ;
- Kim, Bong-Ho (Department of Electronic Engineering, Hanyang University) ;
- Chun, Sung-Woo (Department of Electronic Engineering, Hanyang University) ;
- Kwon, Ji-Hun (Department of Electronic Engineering, Hanyang University) ;
- Choi, Seon-Jun (Department of Electronic Engineering, Hanyang University) ;
- Lee, Seung-Beck (Department of Electronic Engineering, Hanyang University)
- 발행 : 2011.12.05
초록
We have demonstrated the fabrication of sub 30 nm MTJ pillars with PMA characteristics. The multi-step IBE process performed at
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