한국재료학회:학술대회논문집 (Proceedings of the Materials Research Society of Korea Conference)
- 한국재료학회 2011년도 춘계학술발표대회
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- Pages.64.2-64.2
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- 2011
Co-sputtering of Microcrystalline SiGe Thin Films for Optoelectronic Devices
- 발행 : 2011.05.27
초록
Recently, Silicon Germanium (SiGe) alloys have been received considerable attention for their great potentials in advanced electronic and optoelectronic devices. Especially, microcrystalline SiGe is a good channel material for thin film transistor due to its advantages such as narrow and variable band gap and process compatibility with Si based integrated circuits. In this work, microcrystalline silicon-germanium films (