Proceedings of the Korean Magnestics Society Conference (한국자기학회:학술대회 개요집)
- 2010.06a
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- Pages.70-71
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- 2010
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- 2233-9485(pISSN)
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- 2233-9574(eISSN)
Manipulation of Perpendicular Anisotropy in FePt Patterned Media for Ultra-high Density Magnetic Recording
- Kim, Hyun-Su (Department of Materials Science and Engineering, Yonsei University) ;
- Noh, Jin-Seo (Department of Materials Science and Engineering, Yonsei University) ;
- Roh, Jong-Wook (Department of Materials Science and Engineering, Yonsei University) ;
- Chun, Dong-Won (Korea Institute of Science and Technology (KIST)) ;
- Kim, Sung-Man (Korea Institute of Science and Technology (KIST)) ;
- Jung, Sang-Hyun (Nano Process Division, Korea Advanced Nano Fab. Center) ;
- Kang, Ho-Kwan (Nano Process Division, Korea Advanced Nano Fab. Center) ;
- Jeung, Won-Yong (Korea Institute of Science and Technology (KIST)) ;
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Lee, Woo-Young
(Department of Materials Science and Engineering, Yonsei University)
- Published : 2010.06.10
Abstract
In this study, We fabricated FePt-based perpendicular patterned media using a selective combination of E-beam lithography and either Ar plasma etching (deposition-first process) or FePt lift-off (deposition-last process). We employed the deposition-last process to avoid chemical and structural disordering by impinging Ar ions (deposition-first process). For a patterned medium with 100 nm patterns made by this process, the out-of-plane coercivity was measured to be 5 fold larger than its in-plane value. The deposition-last process may be a promising way to achieve ultra-high density patterned media.
Keywords