Manipulation of Perpendicular Anisotropy in FePt Patterned Media for Ultra-high Density Magnetic Recording

  • Kim, Hyun-Su (Department of Materials Science and Engineering, Yonsei University) ;
  • Noh, Jin-Seo (Department of Materials Science and Engineering, Yonsei University) ;
  • Roh, Jong-Wook (Department of Materials Science and Engineering, Yonsei University) ;
  • Chun, Dong-Won (Korea Institute of Science and Technology (KIST)) ;
  • Kim, Sung-Man (Korea Institute of Science and Technology (KIST)) ;
  • Jung, Sang-Hyun (Nano Process Division, Korea Advanced Nano Fab. Center) ;
  • Kang, Ho-Kwan (Nano Process Division, Korea Advanced Nano Fab. Center) ;
  • Jeung, Won-Yong (Korea Institute of Science and Technology (KIST)) ;
  • Lee, Woo-Young (Department of Materials Science and Engineering, Yonsei University)
  • Published : 2010.06.10

Abstract

In this study, We fabricated FePt-based perpendicular patterned media using a selective combination of E-beam lithography and either Ar plasma etching (deposition-first process) or FePt lift-off (deposition-last process). We employed the deposition-last process to avoid chemical and structural disordering by impinging Ar ions (deposition-first process). For a patterned medium with 100 nm patterns made by this process, the out-of-plane coercivity was measured to be 5 fold larger than its in-plane value. The deposition-last process may be a promising way to achieve ultra-high density patterned media.

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