한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2010년도 하계학술대회 논문집
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- Pages.40-40
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- 2010
원자층 증착법을 이용한 ZnO:Al 박막의 특성
Characteristics of Atomic Layer-Controlled ZnO:Al Films by Atomic Layer Deposition
- Oh, Byeong-Yun (Daegu-Gyeongbuk Institute of Science and Technology) ;
- Baek, Seong-Ho (Daegu-Gyeongbuk Institute of Science and Technology) ;
- Kim, Jae-Hyun (Daegu-Gyeongbuk Institute of Science and Technology) ;
- Lee, Hee-Jun (Yonsei University) ;
- Kang, Young-Gu (Yonsei University) ;
- Seo, Dae-Shik (Yonsei University)
- 발행 : 2010.06.16
초록
Structural, electrical, and optical properties of atomic layer-controlled AI-doped ZnO (ZnO:Al) films grown on glass by atomic layer deposition (ALD) were characterized with various