한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2009년도 제36회 동계학술대회 초록집
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- Pages.269.1-269.1
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- 2009
Transparent Thin Film Transistor using $Al_2O_3$ /$HfO_2$ as Gate Insulator Layer
- Park, J.K. (School of Information and Communication engineering, Sungkyunkwan University) ;
- Roh, Yong-Han (School of Information and Communication engineering, Sungkyunkwan University)
- 발행 : 2009.02.11