Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2009.02a
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- Pages.251.1-251.1
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- 2009
Effects of $CH_2F_2$ and $H_2$ flow rates on process window for infinite etch selectivity of silicon nitride to PVD a-C in dual-frequency capacitively coupled plasmas
- Published : 2009.02.11
Abstract
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