한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2009년도 제36회 동계학술대회 초록집
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- Pages.169.1-169.1
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- 2009
The characterization of low-k SiCOH etched film as a function of plasma power
- Lee, Sung-Woo (Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science, Sungkyunkwan University) ;
- Woo, Ji-Hyung (Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science, Sungkyunkwan University) ;
- Choi, Seung-Chae (Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science, Sungkyunkwan University) ;
- Jung, Dong-Geun (Department of Physics, Brain Korea 21 Physics Research Division, Institute of Basic Science, Sungkyunkwan University) ;
- Yang, Jae-Young (Advanced Nano-tech Development Team, Semiconductor Business, Dongbu HiTek co., Ltd.) ;
- Boo, Jin-Hyo (Department of chemistry, Sungkyunkwan University) ;
- Cho, Sang-Jin (Department of chemistry, Sungkyunkwan University) ;
- Chae, Hee-Yeop (Department of Chemical Engineering, Sungkyunkwan University)
- 발행 : 2009.02.11