Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2009.08a
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- Pages.220-220
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- 2009
Leakage current and electrical breakdown in plasma enhanced chemical vapor deposited low dielectric constant SiOC(-H) films
- Lee, Heang-Seuk (Nano Thin Film Materials Laboratory, Department of Physics, Cheju National University) ;
- Kim, Chang-Young (Nano Thin Film Materials Laboratory, Department of Physics, Cheju National University) ;
- Woo, Jong-Kwan (Nano Thin Film Materials Laboratory, Department of Physics, Cheju National University) ;
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Choi, Chi-Kyu
(Nano Thin Film Materials Laboratory, Department of Physics, Cheju National University)
- Published : 2009.08.19
Abstract
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