한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2009년도 하계학술대회 논문집
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- Pages.216-216
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- 2009
초고온 시스템용 SiCN 마이크로 구조물 제작
Fabrication SiCN micro structures for extreme high temperature systems
- Thach, Phan Dui (University of Ulsan) ;
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Chung, Gwiy-Sang
(University of Ulsan)
- 발행 : 2009.06.18
초록
This paper describes a novel processing technique for the fabrication of polymer-derived SiCN (silicone carbonitride) microstructures for extreme microelectromechanical system (MEMS) applications. A polydimethylsiloxane (PDMS) mold was formed on an SU-8 pattern using a standard UV photolithographic process. Next, the liquid precursor, polysilazane, was injected into the PDMS mold to fabricate free-standing SiCN microstructures. Finally, the solid polymer SiCN microstructure was cross-linked using hot isostatic pressure at