Study of FFF with Optically-Controlled Microwave Pulses in Non-uniform Plasma Layer

  • Wang, Xue (Division of Electrical Electronic & Information Engineering, Wonkwang University) ;
  • Seo, Dong-Ho (Division of Electrical Electronic & Information Engineering, Wonkwang University) ;
  • Kim, Yong-K. (Division of Electrical Electronic & Information Engineering, Wonkwang University)
  • Published : 2009.06.18

Abstract

In this paper we study on the semiconductor characteristic by calculating the variation of reflection function in microstrip lines, which has open-ended termination containing an optically induced plasma region. The variation of impedances resulting from the presence of plasma has evaluated with time and frequency domain. The responses have been also evaluated theoretically for changing the phase of the variation in the reflection.

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