Proceedings of the Materials Research Society of Korea Conference (한국재료학회:학술대회논문집)
- 2009.11a
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- Pages.24.1-24.1
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- 2009
Chemical vapor deposition of $TaC_xN_y$ films using tert-butylimido tris-diethylamido tantalum(TBTDET) : Reaction mechanism and film characteristics
- Kim, Suk-Hoon (System on Chip Chemical Process Research Center,Department of Chemical Engineering, POSTECH) ;
- Rhee, Shi-Woo (System on Chip Chemical Process Research Center,Department of Chemical Engineering, POSTECH)
- Published : 2009.11.05
Abstract
Tantalum carbo-nitride(