한국정보디스플레이학회:학술대회논문집
- 2009.10a
- /
- Pages.1408-1411
- /
- 2009
Organic Acid-Based Wet Chemical Etching of Amorphous Ga-Doped Zinc Oxide Films on Glass and PET substrates
- Lee, Dong-Kyoon (Dept. of Materials Science and Engineering, Hongik University) ;
- Lee, Seung-Jung (LG Research Park, LG Chem. Ltd.) ;
- Bang, Jung-Sik (LG Research Park, LG Chem. Ltd.) ;
- Park, Mun-Gi (LG Display. Ltd.) ;
- Yang, Hee-Sun (Dept. of Materials Science and Engineering, Hongik University)
- Published : 2009.10.12
Abstract
This paper describes organic acid-based wet chemical etching behaviors of amorphous Ga-doped zinc oxide (GZO) thin film sputter-deposited at low temperature (room temperature). Wet etch parameters such as etching time, temperature, and etchant concentration are investigated for formic and citric acid etchants, and their effects on the etch rate, etch residue and the feature of edge line are compared.