한국정보디스플레이학회:학술대회논문집
- 2009.10a
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- Pages.951-952
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- 2009
Electronics processed at very low temperature (T<180$^{\circ}C$ )
- Mohammed-Brahim, T. (Groupe Microelectronique, IETR, University Rennes 1)
- Published : 2009.10.12
Abstract
The long way toward new silicon technology, processed at very low temperature on any substrate, is described. The technology is based on CMIS (Complementary Metal Insulator Semiconductor) structure that shown its efficiency with known CMOS electronics. Present performance of this new technology is discussed through electrical parameters and reliability of transistors.
Keywords