한국정보디스플레이학회:학술대회논문집
- 2009.10a
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- Pages.246-249
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- 2009
UV Optical Solutions for Thin Film Processing and Annealing Research
- Delmdahl, Ralph (Coherent GmbH) ;
- Shimizu, Hiroshi (Coherent GmbH) ;
- Dittmar, Mirko (Coherent GmbH) ;
- Fechner, Burkhard (Coherent GmbH)
- Published : 2009.10.12
Abstract
A compact, flexible family of UV laser material processing systems has been developed to drive advancements in both large area processing and annealing of semiconductor surfaces. UV photons can either be applied via demagnifying a mask pattern image or by scanning a homogenized excimer beam across the substrate area. 193nm, 248nm and 308nm wavelength applications are supported.